TRIMETHYLGALLIUM CAS#: 1445-79-0; ChemWhat Code: 109924

IdentificationPhysical DataSpectra
Route of Synthesis (ROS)Safety and HazardsOther Data

Identification

Product NameTRIMETHYLGALLIUM
IUPAC Nametrimethylgallane 
Molecular StructureTRIMETHYLGALLIUM-CAS-1445-79-0
CAS Registry Number 1445-79-0
EINECS Number215-897-6
MDL NumberMFCD00014841
SynonymsTRIMETHYLGALLIUM
1445-79-0
trimethylgallane
Gallium, trimethyl-
MFCD00014841
Gallium trimethyl
EINECS 215-897-6
Trimethylgallium, elec.gr.
Trimethylgallium, elec. gr.
(CH3)3Ga
DTXSID2061696
AKOS015914830
FT-0659225
A808237
Q419426
Trimethylgallium, packaged for use in deposition systems
Molecular FormulaC3H9Ga
Molecular Weight114.83
InChIInChI=1S/3CH3.Ga/h3*1H3
InChI KeyXCZXGTMEAKBVPV-UHFFFAOYSA-N
Isomeric SMILESC[Ga](C)C

Physical Data

No data available

Density, g·cm-3Measurement Temperature, °C
1.453-130.16
1.448-153.16
1.453-140.16
Description (Association (MCS))Partner (Association (MCS))
Adsorptionsilica
AdsorptionInSb(100)
AdsorptionGaN(0001)

Spectra

Description (NMR Spectroscopy)Nucleus (NMR Spectroscopy)Solvents (NMR Spectroscopy)
Chemical shifts1Hbenzene-d6
Chemical shifts13Cbenzene-d6
Chemical shifts1H(2)H8-toluene
Chemical shifts13C(2)H8-toluene
Description (IR Spectroscopy)Solvent (IR Spectroscopy)Temperature (IR Spectroscopy), °C
Spectrumneat (no solvent, gas phase)300.84
Bandsneat (no solvent, gas phase)300.84
Bandsfurther solvent(s)-153.16 – -133.16
Bandsneat (no solvent)9.84
Description (UV/VIS Spectroscopy)Solvent (UV/VIS Spectroscopy)Comment (UV/VIS Spectroscopy)
Spectrumgas190 nm – 310 nm
Spectrum, Band assignmentneat (no solvent)106 nm – 270 nm
Spectrumgaseous matrix190 nm – 390 nm

Route of Synthesis (ROS)

Route of Synthesis (ROS) of TRIMETHYLGALLIUM CAS 1445-79-0

Route of Synthesis (ROS) of TRIMETHYLGALLIUM CAS 1445-79-0

ConditionsYield
With magnesium In neat (no solvent) byproducts: MgI2; inert atm.; heating (autoclave, 120-160°C, 12 h); distn.;65%

Safety and Hazards

Pictogram(s)
SignalDanger
GHS Hazard StatementsH225 (15.64%): Highly Flammable liquid and vapor [Danger Flammable liquids]
H250 (100%): Catches fire spontaneously if exposed to air [Danger Pyrophoric liquids]
H260 (84.36%): In contact with water releases flammable gases which may ignite spontaneously [Danger Substances and mixtures which in contact with water, emit flammable gases]
H261 (15.64%): In contact with water releases flammable gas [Danger Substances and mixtures which in contact with water, emit flammable gases]
H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
H318 (60.91%): Causes serious eye damage [Danger Serious eye damage/eye irritation]
Precautionary Statement CodesP210, P222, P223, P231, P231+P232, P233, P240, P241, P242, P243, P260, P264, P264+P265, P280, P301+P330+P331, P302+P335+P334, P302+P361+P354, P303+P361+P353, P304+P340, P305+P354+P338, P316, P317, P321, P363, P370+P378, P402+P404, P403+P235, P405, and P501
(The corresponding statement to each P-code can be found at the GHS Classification page.)

Other Data

Shelf Life1 year
Druglikeness
Lipinski rules component
Molecular Weight114.827
logP1.584
HBA0
HBD0
Matching Lipinski Rules4
Veber rules component
Polar Surface Area (PSA)0
Rotatable Bond (RotB)0
Matching Veber Rules2
Toxicity/Safety Pharmacology
Quantitative Results
Use Pattern
TRIMETHYLGALLIUM CAS#: 1445-79-0 serves as a key precursor in thin film deposition technologies, including CVD and ALD. It is used to deposit high-quality gallium compound films in the semiconductor industry and other fields. And Trimethylgallium plays a critical role in the fabrication of optoelectronic devices, including solar cells and other optoelectronic devices.
Trimethylgallium is also utilized in metalorganic chemistry as an organometallic precursor, participating in some organic synthesis reactions.

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